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International Journal of Nano Dimension، جلد ۵، شماره Issue ۴، صفحات ۴۱۵-۴۱۹
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| عنوان فارسی |
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| چکیده فارسی مقاله |
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| کلیدواژه‌های فارسی مقاله |
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| عنوان انگلیسی |
Change of diffused and scattered light with surface roughness of p-type porous Silicon |
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| چکیده انگلیسی مقاله |
Porous silicon samples were prepared by electrochemical etching method for different etching times. The structural properties of porous silicon (PS) samples were determined from the Atomic Force Microscopy (AFM) measurements. The surface mean root square roughness (σ rms) changes as function of porosity were studied, and the influence of etching time on porosity and roughness was studied too. UV-Vis-NIR Spectrophotometer with integrating sphere accessory used to measure the specular reflectance (Rspec) and scattered light (Dsca) for all samples. Changes of scattered light intensity with σ rms were studied. Theoretical and measured values were compared and they were almost the same. |
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| کلیدواژه‌های انگلیسی مقاله |
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| نویسندگان مقاله |
f alfeel |
department of physics, science faculty, damascus university, syria.
f عوض |
department of physics, science faculty, damascus university, syria.
i alghoraibi |
department of physics, science faculty, damascus university, syria.
f قمر |
department of physics, science faculty, damascus university, syria.
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| نشانی اینترنتی |
http://www.ijnd.ir/article_5576_288ec1fb64a72accebfacc8379f034a4.pdf |
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| کد مقاله (doi) |
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| زبان مقاله منتشر شده |
en |
| موضوعات مقاله منتشر شده |
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| نوع مقاله منتشر شده |
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